KEHONG Material Corporation Limited is an expert in manufacturing sputtering targets. We can offer a full line of sputtering targets with various components from industrial grade to super high purity. Mostly targets are manufacture by programs. Also KEHONG can manufacture targets that are less and rarely frequently used compositions. Also KEHONG can offer some addition server include substrade, bonding, backing plate. KEHONG Material Corporation Limited insisted? on improving? our fabrication techniques for supplying more valuable and better products.
Sputtering Targets list
LREE (Light Rare Earth Elements)
Lanthanum targets
Cerium Targets
Praseodymium Targets
Neodymium Targets
Samarium Targets
Europium Targets
Gadolinium Targets
Lanthanum oxide targets
Cerium oxide Targets
Praseodymium oxide Targets
Neodymium oxide Targets
Samarium oxide Targets
Europium oxide Targets
Gadolinium oxide Targets
HREE (Heavy Rare Earth Elements)
Terbium Targets
Dysprosium Targets
Holmium Targets
Erbium Targets
Thulium Targets
Ytterbium Targets
Lutetium Targets
Yttrium Targets
Scandium Targets
Terbium oxide Targets
Dysprosium oxide Targets
Holmium oxide Targets
Erbium oxide Targets
Thulium oxide Targets
Ytterbium oxide Targets
Lutetium oxide Targets
Yttrium oxide Targets
Scandium oxide Targets
Other Sputtering Targets Materials list:
Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, Carbon, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), etc.
Alloy Sputtering Targets: Al Alloy, Ce Alloy, Co Alloy，Fe Alloy, Ni Alloy, Ti Alloy, etc. Custom alloy targets are available.
Other Ceramic sputtering target:
Boride Ceramic Sputtering Targets
Carbide Ceramic Sputtering Targets
Fluoride Ceramic Sputtering Targets
Nitride Ceramic Sputtering Targets
Oxide Ceramic Sputtering targets
Selenide Ceramic Sputtering Targets
Silicide Ceramic Sputtering Targets
Sulfide Ceramic Sputtering Targets
Telluride Ceramic Sputtering Targets
Customize sputtering targets
Applications
(1) Microelectronics
Thin film technology trends target material technology trends and downstream applications industries closely related to the film industry with the application of the product or component technology improvements, target technology should also be changes.
When facing Ic manufacturer. Recently committed to low resistivity copper wiring development is expected in the coming years will significantly replace the original aluminum, copper target and thus required the development of a barrier layer target will be imperative.
(2) Flat panel display targets
In addition, in recent years, flat panel display (FPD) to substantially replace the original cathode ray tube (CRT) monitors and brain-based Tuen TV market. A significant increase in technology and market demand will ITO targets.
(3) Storage technology targets
In addition, in the storage technology. High density, high capacity hard drive demand, high density rewritable disc continues to increase.
These have led to demands for the target application industry changes.
Pakcking terms are depending on customers' needs. Any questions or inquires please send emails to Info@cnkhre.com or leave a message to us.
Tel: 0086-20-36048126
Fax: 0086-20-36048127
E-mail: info@cnkhre.com
© Copyright 2015 GUANGZHOU KEHONG MINERALS CORPORATION LIMITED.
